RF-sputtering deposition of Al/Al 2 O 3 multilayers

Author： Paven-Thivet L. Malibert C. Houdy P. Albouy P.A.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.336, Iss.1, 1998-12, pp. : 373-376

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Optical Nonlinearity in PbTiO3 Thin Film Deposited on -Al2O3 with RF-Sputtering System

By Gan F.X. Gu Y.Z. Gu D.H.

Molecular Crystals and Liquid Crystals Science and Technology. Section B. Nonlinear Optics, Vol. 28, Iss. 4, 2001-01 ,pp. : 283-289

Taylor & Francis Ltd

Access to resources Recommend Favorite

Study of ZrO 2 /Al 2 O 3 multilayers

By Gao P. Meng L.J. dos Santos M.P. Teixeira V. Andritschky M.

Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. : 267-273

Elsevier

Access to resources Recommend Favorite

Light emission from the double-barrier Al/Al 2 O 3 /Al/Al 2 O 3 /Au tunnel junction

By Wang M.-X. Sun C.-X.

Thin Solid Films, Vol. 371, Iss. 1, 2000-08 ,pp. : 191-194

Elsevier

Access to resources Recommend Favorite

Optical and electrical properties of InN thin films grown on ZnO/ -Al 2 O 3 by RF reactive magnetron sputtering

By Ikuta K. Inoue Y. Takai O.

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 49-53

Elsevier

Access to resources Recommend Favorite

Chemical vapour deposition of -Al 2 O 3

By Ruppi S. Larsson A.

Thin Solid Films, Vol. 388, Iss. 1, 2001-06 ,pp. : 50-61

Elsevier

Access to resources Recommend Favorite