Ion implantation of microcrystalline silicon for low process temperature top gate thin film transistors

Author： Chu V.   Silva H.   Redondo L.M.   Jesus C.   Silva M.F.   Soares J.C.   Conde J.P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.337, Iss.1, 1999-01, pp. : 203-207

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