Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition

Author: Koh S.K.   Choi S.C.   Kim K.H.   Jung H.-J.   Choi G.J.   Yang H.S.   Cho Y.S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.347, Iss.1, 1999-06, pp. : 121-126

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Abstract