Characterization of C-N thin films deposited by reactive excimer laser ablation of graphite targets in nitrogen atmosphere

By Luches A.   Caricato A.P.   Leggieri G.   Perrone A.   Gyorgy E.   Mihailescu I.N.   Popescu M.   Barucca G.   Mengucci P.   Zemek J.   Trchova M.  

Thin Solid Films, Vol. 307, Iss. 1, 1997-10 ,pp. : 54-59

Elsevier

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Preparation of silicon oxynitride (SiO x N y ) thin films by pulsed laser deposition

By Xiao R.-F.   Ng L.C.   Jiang C.   Yang Z.Y.   Wong G.K.L.  

Thin Solid Films, Vol. 260, Iss. 1, 1995-05 ,pp. : 10-13

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Characterization of TiAlN films deposited by reactive pulsed laser ablation

By Acquaviva S.   D'Anna E.   Elia L.   Fernandez M.   Leggieri G.   Luches A.   Martino M.   Mengucci P.   Zocco A.  

Thin Solid Films, Vol. 379, Iss. 1, 2000-12 ,pp. : 45-49

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Characterization of SiO x N y films deposited from SiCI 4 by remote plasma-enhanced chemical vapor deposition

By Sanchez O.   Aguilar M.A.   Falcony C.   Martnez-Duart J.M.   Hernandez Velez M.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 149-152

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Optical studies of carbon nitride thin films deposited by reactive pulsed laser ablation of a graphite target in low pressure ammonia

By Mihailescu I.N.   Gyorgy E.   Alexandrescu R.   Luches A.   Perrone A.   Ghica C.   Werckmann J.   Cojocaru I.   Chumash V.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 72-78

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