Characterization of SiO x N y films deposited from SiCI 4 by remote plasma-enhanced chemical vapor deposition

Author： Sanchez O. Aguilar M.A. Falcony C. Martnez-Duart J.M. Hernandez Velez M.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.317, Iss.1, 1998-04, pp. : 149-152

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