Annealing ultra thin Ta 2 O 5 films deposited on bare and nitrogen passivated Si(100)

Author: Mao A.Y.   Son K.-A.   Hess D.A.   Brown L.A.   White J.M.   Kwong D.L.   Roberts D.A.   Vrtis R.N.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.349, Iss.1, 1999-07, pp. : 230-237

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract