Properties of SiO 2 and Si 3 N 4 layers deposited by MF twin magnetron sputtering using different target materials

Author: Ruske M.   Brauer G.   Pistner J.   Szczyrbowski J.   Weigert M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.351, Iss.1, 1999-08, pp. : 158-163

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Abstract