Properties of amorphous SiO 2 films prepared by reactive RF magnetron sputtering method

Author: He L.-N.   Xu J.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.68, Iss.2, 2002-10, pp. : 197-202

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract