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Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

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Plasma deposition of amorphous carbon films from CH 4 atmospheres highly diluted in Ar

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Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition

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Deposition of large area amorphous silicon films by ECR plasma CVD

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