Author: Jacobsohn L.G. Capote G. Cruz N.C. Zanatta A.R. Freire Jr. F.L.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 46-53
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Structure changes in a-C:H films in inductive CH 4 /Ar plasma deposition
By Teii K.
Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. :
Plasma deposition of amorphous carbon films on copper
By Chiu S. Turgeon S. Terreaul B. Sarkissian A.
Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. :
By Gonnord H. Jaouen M. delafond J. Girardeau T.
Wear, Vol. 231, Iss. 1, 1999-06 ,pp. :
Low dielectric fluorinated amorphous carbon thin films grown from C 6 F 6 and Ar plasma
Thin Solid Films, Vol. 374, Iss. 1, 2000-10 ,pp. :