Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.365, Iss.2, 2000-04, pp. : 334-347
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Modeling plasma processes in microelectronics
By Richards D.F. Bloomfield M.O. Soukane S. Cale T.S.
Vacuum, Vol. 59, Iss. 1, 2000-10 ,pp. :
Modeling and simulation of plasma etching reactors for microelectronics
Thin Solid Films, Vol. 365, Iss. 2, 2000-04 ,pp. :
Advanced plasma technology in microelectronics
By Jung C.O. Chi K.K. Hwang B.G. Moon J.T. Lee M.Y. Lee J.G.
Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. :
Plasma processes in microelectronic device manufacturing
Vacuum, Vol. 65, Iss. 3, 2002-05 ,pp. :