Factors limiting the composition window for fabrication of SiGe-on-insulator substrate by low-energy oxygen implantation

Author： Ishikawa Y.   Shibata N.   Fukatsu S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 213-216

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