Cyclic alkylsilanes as low-pressure chemical vapor deposition silicon dioxide precursors

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Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. : 117-121

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Growth mechanisms of crystallites in the mixed-phase silicon films deposited by low-pressure chemical vapor deposition

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Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools

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