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Growth mechanisms of crystallites in the mixed-phase silicon films deposited by low-pressure chemical vapor deposition

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Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools

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Thin Solid Films, Vol. 396, Iss. 1, 2001-09 ,pp. : 146-166

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Control of self-assembling formation of nanometer silicon dots by low pressure chemical vapor deposition

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Using tetrakis-diethylamido-hafnium for HfO 2 thin-film growth in low-pressure chemical vapor deposition

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