Theoretical study of penetration reaction of fluorine atoms and ions into hydrogen-terminated Si(111) thin film

Author： Makino O.   Sakata K.   Yamazaki H.   Iguchi K.   Tachibana A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.374, Iss.2, 2000-10, pp. : 143-149

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