Author: Chang K.-M. Yang J.-Y. Chen L.-W. Hau Tseng M.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.376, Iss.1, 2000-11, pp. : 124-130
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
A Cat-CVD Si 3 N 4 film study and its application to the ULSI process
By Uchiyama Y. Masuda A. Matsumura H.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :