Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films

Author: Gautier C.   Moulard G.   Chatelon J.P.   Motyl G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.384, Iss.1, 2001-03, pp. : 102-108

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Abstract