Effect of sputtering-gas pressure on properties of silicon nitride films produced by helicon plasma sputtering

Author： Li W.-T. McKenzie D.R. McFall W.D. Zhang Q.-C.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.384, Iss.1, 2001-03, pp. : 46-52

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