Formation mechanism of silicon based luminescence material using a photo chemical etching method

Author: Yamamoto N.   Takai H.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.388, Iss.1, 2001-06, pp. : 138-142

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract