Growth-etching competitive mechanism governing the structure and chemical composition of plasma-deposited silicon-based materials

Author: Ambrosone G.   Bruno G.   Capezzuto P.   Cicala G.   Coscia U.  

Publisher: Taylor & Francis Ltd

ISSN: 1463-6417

Source: Philosophical Magazine B, Vol.80, Iss.4, 2000-04, pp. : 487-496

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Abstract