Erratum to ''Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD'' - [Thin Solid Films 430 (2003) 110-115]

By Bouree J.E.   Guillet J.   Grattepain C.   Chaumont J.  

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 294-294

Elsevier

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Microcrystalline silicon for solar cells deposited at high rates by hot-wire CVD

By Iwaniczko E.   Xu Y.   Schropp R.E.I.   Mahan A.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 212-215

Elsevier

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

Elsevier

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Hot-wire CVD-grown microcrystalline silicon films with and without initial growing layer modification by transformer-coupled plasma

By Kim D.Y.   Ahn B.J.   Moon S.I.   Yi J.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 184-187

Elsevier

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Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

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