Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

Access to resources Recommend Favorite

The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

By van Veenendaal P.A.T.T.   Gijzeman O.L.J.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 194-197

Elsevier

Access to resources Recommend Favorite

Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

Elsevier

Access to resources Recommend Favorite

Hot-wire silicon nitride for thin-film transistors

By Stannowski B.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 339-342

Elsevier

Access to resources Recommend Favorite

Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

Access to resources Recommend Favorite