Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

By Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

Elsevier

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Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

By Zhu M.   Guo X.   Chen G.   Han H.   He M.   Sun K.  

Thin Solid Films, Vol. 360, Iss. 1, 2000-02 ,pp. : 205-212

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

By Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 206-212

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Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

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Thin-film transistors deposited by hot-wire chemical vapor deposition

By Stannowski B.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 220-225

Elsevier

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