The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

By van Veenendaal P.A.T.T.   Gijzeman O.L.J.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 194-197

Elsevier

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Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD

By Soler D.   Fonrodona M.   Voz C.   Bertomeu J.   Andreu J.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 189-191

Elsevier

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

Elsevier

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Erratum to ''Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD'' - [Thin Solid Films 430 (2003) 110-115]

By Bouree J.E.   Guillet J.   Grattepain C.   Chaumont J.  

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 294-294

Elsevier

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Hydrogen passivation and junction formation on APIVT-deposited thin-layer silicon by hot-wire CVD

By Wang T.H.   Wang Q.   Page M.R.   Bauer R.E.   Ciszek T.F.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 261-264

Elsevier

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