Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD

By Bouree J.E.   Guillet J.   Grattepain C.   Chaumont J.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 110-115

Elsevier

Access to resources Recommend Favorite

Erratum to ''Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD'' - [Thin Solid Films 430 (2003) 110-115]

By Bouree J.E.   Guillet J.   Grattepain C.   Chaumont J.  

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 294-294

Elsevier

Access to resources Recommend Favorite

High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

Elsevier

Access to resources Recommend Favorite

Hot-wire CVD-grown microcrystalline silicon films with and without initial growing layer modification by transformer-coupled plasma

By Kim D.Y.   Ahn B.J.   Moon S.I.   Yi J.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 184-187

Elsevier

Access to resources Recommend Favorite

The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

By van Veenendaal P.A.T.T.   Gijzeman O.L.J.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 194-197

Elsevier

Access to resources Recommend Favorite