Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

Author： Karasawa M. Masuda A. Ishibashi K. Matsumura H.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 71-74

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