Crystallization by excimer laser annealing for a-Si:H films with low hydrogen content prepared by Cat-CVD

By Yogoro Y.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 296-299

Elsevier

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Is the nucleation and coalescence behavior in the growth of a-Si:H films prepared by the CAT-CVD different?

By Dusane R.O.   Bauer S.   Schroder B.   Oechsner H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 121-124

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Preparation of SiO 2 thin films using the Cat-CVD method

By Saito K.   Uchiyama Y.   Abe K.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 287-291

Elsevier

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Fabrication of a-Si 1-x C x :H thin films for solar cells by the Cat-CVD method using a carbon catalyzer

By Sugita K.   Itoh M.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 170-173

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Preparation of B-doped a-Si 1-x C x :H films and heterojunction p-i-n solar cells by the Cat-CVD method

By Chikusa K.   Takemoto K.   Itoh T.   Yoshida N.   Nonomura S.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 245-248

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