The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures

Author： Cabral Jr. C.   Lavoie C.   Harper J.M.E.   Jordan-Sweet J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.397, Iss.1, 2001-10, pp. : 194-202

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