Elimination of O 2 plasma damage of low-k methyl silsesquioxane film by As implantation

Author： Wang C.Y.   Zheng J.Z.   Shen Z.X.   Lin Y.   Wee A.T.S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.397, Iss.1, 2001-10, pp. : 90-94

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