Cross-sectional thin film characterization of Si compounds in semiconductor device structures using both elemental and ELNES mapping by EFTEM

Author： Worch M.   Engelmann H.J.   Blum W.   Zschech E.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.405, Iss.1, 2002-02, pp. : 198-204

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