Characterization of RuO 2 thin films deposited on Si by metal-organic chemical vapor deposition

Author： Liao P.C.   Mar S.Y.   Ho W.S.   Huang Y.S.   Tiong K.K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.287, Iss.1, 1996-10, pp. : 74-79

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