Ge-doped SiO 2 thin films produced by helicon activated reactive evaporation

Author： Li W.T.   Bulla D.A.P.   Charles C.   Boswell R.   Love J.   Luther-Davies B.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 82-87

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