Hydrogen-radical durability of TiO 2 thin films for protecting transparent conducting oxide for Si thin film solar cells

Author： Natsuhara H.   Ohashi T.   Ogawa S.   Yoshida N.   Itoh T.   Nonomura S.   Fukawa M.   Sato K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.430, Iss.1, 2003-04, pp. : 253-256

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