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Elsevier

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Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

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Large-grained polycrystalline silicon on glass by copper vapor laser annealing

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Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

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