Hot-wire chemical vapor deposition for epitaxial silicon growth on large-grained polycrystalline silicon templates

By Mason M.S.   Chen C.M.   Atwater H.A.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 54-57

Elsevier

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Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

Elsevier

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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

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Hot-wire chemical vapor deposition of carbon nanotubes

By Dillon A.C.   Mahan A.H.   Alleman J.L.   Heben M.J.   Parilla P.A.   Jones K.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 292-295

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Spectroscopic and kinetic ellipsometry studies of hot-wire deposited polycrystalline silicon on glass

By van Veenendaal P.A.T.T.   van der Mark G.W.M.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 41-45

Elsevier

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