High-rate deposition of highly crystallized silicon films from inductively coupled plasma

Author: Kosku N.   Kurisu F.   Takegoshi M.   Takahashi H.   Miyazaki S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 39-43

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Abstract