Evaluation of HfO 2 film structures deposited by metal-organic chemical vapor deposition using Hf(N(C 2 H 5 ) 2 ) 4 /O 2 gas system

Author： Ogura A. Ito K. Ohshita Y. Ishikawa M. Machida H.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.441, Iss.1, 2003-09, pp. : 161-164

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