Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

By Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

Elsevier

Access to resources Recommend Favorite

Microstructural characterization of iron thin films prepared by sputtering at very low temperatures

By Munoz-Martn A.   Vila M.   Prieto C.   Ocal C.   Martnez J.L.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 583-588

Elsevier

Access to resources Recommend Favorite

Characteristics of SrTiO 3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures

By Wang Zhongchun   Kugler Veronika   Helmersson Ulf   Evangelou E. K.   Konofaos N.   Nakao Setsuo   Jin Ping  

Philosophical Magazine B, Vol. 82, Iss. 8, 2002-05 ,pp. : 891-903

Taylor & Francis Ltd

Access to resources Recommend Favorite

Substrate influence on the X-ray diffraction patterns of amorphous chalcogenide thin films deposited on silicon wafers

By Lorinczi A.  

Thin Solid Films, Vol. 408, Iss. 1, 2002-04 ,pp. : 282-285

Elsevier

Access to resources Recommend Favorite

Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

Elsevier

Access to resources Recommend Favorite