Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

Author: Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 105-111

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content