Chemical vapor deposition of tungsten silicide (WSi x ) for high aspect ratio applications

Author： Sell B.   Sanger A.   Schulze-Icking G.   Pomplun K.   Krautschneider W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.443, Iss.1, 2003-10, pp. : 97-107

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