Effect of N 2 O/SiH 4 ratio on the properties of low-temperature silicon oxide films from remote plasma chemical vapour deposition

By Rhee S.-W.   Park Y.-B.   Kang J.-K.  

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 43-50

Elsevier

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Mechanical properties of a-C:H and a-C:H/SiO x nanocomposite thin films prepared by ion-assisted plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 204-210

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IR characterization of a-C:H:N films sputtered in Ar/CH 4 /N 2 plasma

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Effects of chlorine on tribological properties of TiN films prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 407, Iss. 1, 2002-03 ,pp. : 38-44

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Plasma deposition of carbon films at room temperature from C 2 H 2 -Ar mixtures: anodic vs. cathodic films

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Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 216-219

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