Mechanism of induced reaction during XPS depth profile measurements of CeO 2 /Si films grown by ion beam epitaxy

Author: Yang X.   Wu Z.   Zhao J.   Wang H.   Huang D.   Qin F.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.49, Iss.2, 1998-02, pp. : 139-143

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Abstract