Sub-quarter micron metallization using ionized metal plasma (IMP) technology

Author: Tanaka Y.   Xu Z.   Gopalraja P.   Forster J.   Yao G.   Zhang H.   Nulman J.   Chen F.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.4, 1998-12, pp. : 729-733

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Abstract