Chacterization of titanium silicon nitride films deposited by PVD

Author： Vaz F. Rebouta L. da Silva R.M.C. da Silva M.F. Soares J.C.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.52, Iss.1, 1999-01, pp. : 209-214

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