Author: Touzeau M. Pagnon D. Bretagne J.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.52, Iss.1, 1999-01, pp. : 33-40
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Vanadium reactive magnetron sputtering in mixed Ar/O 2 discharges
By Theil J.A. Kusano E. Rockett A.
Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. :
Plasma chemistry model of DC magnetron reactive sputtering in Ar-O 2 gas mixtures
By Pekker L.
Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. :
Model of d.c. magnetron reactive sputtering in Ar-O 2 gas mixtures
Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. :
By Seifarth H. Schmidt J.U. Grotzschel R. Klimenkov M.
Thin Solid Films, Vol. 389, Iss. 1, 2001-06 ,pp. :
By Morscheidt W. Hassouni K. Arefi-Khonsari F. Amouroux J.
Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. :