Three-dimensional Monte Carlo simulation of sputtered atom transport in the process of ion-plasma sputter deposition of multicomponent thin films

Author： Petrov P.K. Volpyas V.A. Chakalov R.A.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.52, Iss.4, 1999-04, pp. : 427-434

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Monte Carlo simulations of sputter deposition and step coverage of thin films

By Coronell D.G. Egan E.W. Hamilton G. Jain A. Venkatraman R. Weitzman B.

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 77-81

Elsevier

Access to resources Recommend Favorite

Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering

By Petrov P.K. Volpyas V.A. Hollmann E.K. Kawabata K. Tanaka T.

Vacuum, Vol. 48, Iss. 7, 1997-09 ,pp. : 669-670

Elsevier

Access to resources Recommend Favorite

Monte Carlo simulation of ion transport process in ECR microwave plasma with negative bias

By Ye G. Jinyuan L. Yuanhong S. Xiaojun W. Xinlu D. Tengcai M.

Vacuum, Vol. 65, Iss. 3, 2002-05 ,pp. : 353-359

Elsevier

Access to resources Recommend Favorite

Monte Carlo Simulation of Transport

By Kuhl N.M.

Journal of Computational Physics, Vol. 129, Iss. 1, 1996-11 ,pp. : 170-180

Academic Press

Access to resources Recommend Favorite

Deposition of Iridium Thin Films on Three‐Dimensional Structures With PE‐MOCVD

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 21, Iss. 1-2-3, 2015-03 ,pp. : 46-53

John Wiley & Sons Inc

Access to resources Recommend Favorite