Spatially resolved optical emission spectroscopy of the secondary glow observed during biasing of a microwave plasma

Author： Whitfield M.D. Jackman R.B. Foord J.S.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.56, Iss.1, 2000-01, pp. : 15-23

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Determination of the electron temperature profile above the evaporative source in an ion plating discharge by spatially resolved optical emission spectroscopy

By Wilson A.D. Davison A. Leyland A. Matthews A. Fancey K.S.

Thin Solid Films, Vol. 434, Iss. 1, 2003-06 ,pp. : 157-161

Elsevier

Access to resources Recommend Favorite

Dynamic actinometric optical emission spectroscopy for the elucidation of plasma processes in the production of fluorinated amorphous hydrogenated carbon films from glow discharges

By Durrant S.F. Bica de Moraes M.A.

Thin Solid Films, Vol. 277, Iss. 1, 1996-05 ,pp. : 115-120

Elsevier

Access to resources Recommend Favorite

Optical emission spectroscopy of rf glow discharges of methane-silane mixtures

By Andujar J.L. Pascual E. Viera G. Bertran E.

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 120-123

Elsevier

Access to resources Recommend Favorite

An investigation into dissociative mechanisms in nitrogenous glow discharges by optical emission spectroscopy

By Fancey K.S.

Vacuum, Vol. 46, Iss. 7, 1995-07 ,pp. : 695-700

Elsevier

Access to resources Recommend Favorite

Optical emission spectroscopy of argon-silane plasma

By Strunin V.

Russian Physics Journal, Vol. 54, Iss. 2, 2011-07 ,pp. : 254-256

Springer Publishing Company

Access to resources Recommend Favorite