Deposition of 3C-SiC films using ECR plasma of methylsilane

Author： Matsutani T.   Kiuchi M.   Takeuchi T.   Matsumoto T.   Mimoto K.   Goto S.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.59, Iss.1, 2000-10, pp. : 152-158

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