Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition

Author: Miyano R.   Kimura K.   Izumi K.   Takikawa H.   Sakakibara T.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.59, Iss.1, 2000-10, pp. : 159-167

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Abstract