Novel thin-film fabrication method combining pulsed laser ablation and catalytic chemical vapor deposition: application to preparation of Er-doped hydrogenated amorphous Si films

Author： Masuda A.   Sakai J.   Matsumura H.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.59, Iss.2, 2000-11, pp. : 635-640

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